Positive Resist Developer, 500ml

Our Price: CAD $15.90

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MFG Part #: 418-500ML
MG CHEMICALS
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*Lead times are approximate
For removing exposed resist during the positive photofabrication process. Disolves exposed photoresist. Concentrated formulation - dilute one part developer to ten parts water.  Also available in the M.G. Photofabrication Kit (Cat. No. 416-K).